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Elucidating the role of imaging metrics for variability and after etch defectivity

dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorDauendorffer, Arnaud
dc.contributor.authorNafus, Kathleen
dc.contributor.authorRispens, Gijsbert
dc.contributor.authorMaslow, Mark
dc.date.accessioned2023-03-17T09:10:35Z
dc.date.available2022-08-12T02:39:08Z
dc.date.available2023-03-17T09:10:35Z
dc.date.issued2022
dc.identifier.issn1932-5150
dc.identifier.otherWOS:000835428700013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40251.2
dc.sourceWOS
dc.titleElucidating the role of imaging metrics for variability and after etch defectivity
dc.typeJournal article
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.date.embargo2023-05-30
dc.identifier.doi10.1117/1.JMM.21.2.023201
dc.source.numberofpages13
dc.source.peerreviewyes
dc.source.beginpageArt. 023201
dc.source.endpagena
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.issue2
dc.source.volume21
imec.availabilityPublished - imec


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220.500.12860/40251.2*2023-03-17T09:07:59Zvalidation by library/open access desk
120.500.12860/402512022-08-12T02:39:08Z

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