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Modelling and microstructural characterisation of incubation, time-dependent drift and saturation during electromigration in Al-Si-Cu stripes

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorBender, Hugo
dc.contributor.authorRoussel, Philippe
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T11:58:01Z
dc.date.available2021-10-14T11:58:01Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4030
dc.sourceIIOimport
dc.titleModelling and microstructural characterisation of incubation, time-dependent drift and saturation during electromigration in Al-Si-Cu stripes
dc.typeJournal article
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.source.peerreviewno
dc.source.beginpage1603
dc.source.endpage1616
dc.source.journalMicroelectronics and Reliability
dc.source.issue11
dc.source.volume39
imec.availabilityPublished - imec


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