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Stress relaxation in Al-Cu and Al-Si-Cu thin films

dc.contributor.authorWitvrouw, Ann
dc.contributor.authorProost, Joris
dc.contributor.authorRoussel, Philippe
dc.contributor.authorCosemans, P.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T11:58:08Z
dc.date.available2021-10-14T11:58:08Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4031
dc.sourceIIOimport
dc.titleStress relaxation in Al-Cu and Al-Si-Cu thin films
dc.typeJournal article
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1246
dc.source.endpage1254
dc.source.journalJ. Materials Research
dc.source.issue4
dc.source.volume14
imec.availabilityPublished - open access


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