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Optimization of Point-Of-Use Filtration for Metal Oxide Photoresist
dc.contributor.author | Wu, Aiwen | |
dc.contributor.author | Tang, Harvey | |
dc.contributor.author | Conner, Gregg | |
dc.contributor.author | Chang, Shu Hao | |
dc.contributor.author | Giordano, Gaetano | |
dc.contributor.author | Smiddy, Dominick | |
dc.contributor.author | Geniza, Mark | |
dc.contributor.author | Clark, Benjamin L. | |
dc.date.accessioned | 2022-09-08T02:39:17Z | |
dc.date.available | 2022-09-08T02:39:17Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4057-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844537900024 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40387 | |
dc.source | WOS | |
dc.title | Optimization of Point-Of-Use Filtration for Metal Oxide Photoresist | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Chang, Shu Hao | |
dc.contributor.imecauthor | Giordano, Gaetano | |
dc.identifier.doi | 10.1117/12.2583842 | |
dc.identifier.eisbn | 978-1-5106-4058-0 | |
dc.source.numberofpages | 8 | |
dc.source.peerreview | yes | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference | |
dc.source.conferencedate | FEB 22-26, 2021 | |
dc.source.volume | 11612 | |
imec.availability | Under review |
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