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CD control using SiON BARL processing for sub-0.25μm lithography

dc.contributor.authorZhang, Fenghong
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorSchaekers, Marc
dc.contributor.authorRonse, Kurt
dc.contributor.authorConley, W.
dc.contributor.authorGopalan, P.
dc.contributor.authorGangala, Hareen K
dc.contributor.authorDusa, M.
dc.contributor.authorBendik, Joe
dc.date.accessioned2021-10-14T11:59:37Z
dc.date.available2021-10-14T11:59:37Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4044
dc.sourceIIOimport
dc.titleCD control using SiON BARL processing for sub-0.25μm lithography
dc.typeJournal article
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage51
dc.source.endpage54
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume46
imec.availabilityPublished - open access
imec.internalnotesPaper from MNE'98


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