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Evolution of lithography-to-etch bias in multi-patterning processes
dc.contributor.author | Panneerchelvam, Prem | |
dc.contributor.author | Agarwal, Ankur | |
dc.contributor.author | Huard, Chad M. M. | |
dc.contributor.author | Pret, Alessandro Vaglio | |
dc.contributor.author | Mani, Antonio | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Demand, Marc | |
dc.contributor.author | Kumar, Kaushik | |
dc.contributor.author | Paolillo, Sara | |
dc.contributor.author | Lazzarino, Frederic | |
dc.date.accessioned | 2022-10-09T02:50:47Z | |
dc.date.available | 2022-10-09T02:50:47Z | |
dc.date.issued | 2022-DEC | |
dc.identifier.issn | 2166-2746 | |
dc.identifier.other | WOS:000862353600001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40543 | |
dc.source | WOS | |
dc.title | Evolution of lithography-to-etch bias in multi-patterning processes | |
dc.type | Journal article | |
dc.contributor.imecauthor | Paolillo, Sara | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.identifier.doi | 10.1116/6.0002059 | |
dc.source.numberofpages | 14 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | |
dc.source.issue | 6 | |
dc.source.volume | 40 | |
imec.availability | Under review |
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