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Evolution of lithography-to-etch bias in multi-patterning processes
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Authors
Panneerchelvam, Prem
;
Agarwal, Ankur
;
Huard, Chad M. M.
;
Pret, Alessandro Vaglio
;
Mani, Antonio
;
Gronheid, Roel
;
Demand, Marc
;
Kumar, Kaushik
;
Paolillo, Sara
;
Lazzarino, Frederic
DOI
10.1116/6.0002059
ISSN
2166-2746
Issue
6
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume
40
Title
Evolution of lithography-to-etch bias in multi-patterning processes
Publication type
Journal article
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2
20.500.12860/40543.2
*
2022-11-10T15:25:36Z
validation by library/open access desk
1
20.500.12860/40543
2022-10-09T02:50:47Z
*Selected version
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