Now showing items 1-2 of 2

    • Approaches to Enable Patterning of Tight Pitches towards High NA EUV 

      Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022)
    • Evolution of lithography-to-etch bias in multi-patterning processes 

      Panneerchelvam, Prem; Agarwal, Ankur; Huard, Chad M. M.; Pret, Alessandro Vaglio; Mani, Antonio; Gronheid, Roel; Demand, Marc; Kumar, Kaushik; Paolillo, Sara; Lazzarino, Frederic (2022)