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Approaches to Enable Patterning of Tight Pitches towards High NA EUV
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Authors
Tadatomo, Hiroki
;
Dauendorffer, Arnaud
;
Onitsuka, Tomoya
;
Genjima, Hisashi
;
Ido, Yasuyuki
;
Okada, Soichiro
;
Kuwahara, Yuhei
;
Hara, Arisa
;
Dinh, Congque
;
Fujimoto, Seiji
;
Kawakami, Shinichiro
;
Muramatsu, Makoto
;
Shimura, Satoru
;
Nafus, Kathleen
;
Oikawa, Noriaki
;
Ono, Kenta
;
Feurprier, Yannick
;
Demand, Marc
;
Negreira, Ainhoa Romo
;
Nagahara, Seiji
;
Blanco, Victor
;
Foubert, Philippe
;
De Simone, Danilo
DOI
10.1117/12.2614012
EISBN
978-1-5106-4988-0
ISBN
978-1-5106-4987-3
ISSN
0277-786X
Conference
Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Volume
12056
Title
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication type
Proceedings paper
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Conference contributions
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Date
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2
20.500.12860/40392.2
*
2023-01-04T10:47:40Z
validation by library/open access desk
1
20.500.12860/40392
2022-09-08T02:39:18Z
*Selected version
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