Browsing by author "Nagahara, Seiji"
Now showing items 1-5 of 5
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Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert (2021) -
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023)