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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
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Authors
Dinh, Cong Que
;
Nagahara, Seiji
;
Kuwahara, Yuhei
;
Dauendorffer, Arnaud
;
Yoshida, Keisuke
;
Okada, Soichiro
;
Onitsuka, Tomoya
;
Kawakami, Shinichiro
;
Shimura, Satoru
;
Muramatsu, Makoto
;
Yoshihara, Kosuke
;
Petersen, John
;
De Simone, Danilo
;
Foubert, Philippe
;
Vandenberghe, Geert
;
Huli, Lior
;
Grzeskowiak, Steven
;
Krawicz, Alexandra
;
Bae, Nayoung
;
Kato, Kanzo
;
Nafus, Kathleen
;
Raley, Angelique
DOI
10.2494/photopolymer.35.87
ISSN
0914-9244
Issue
1
Journal
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
Volume
35
Title
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Publication type
Journal article
Embargo date
9999-12-31
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2
20.500.12860/41520.2
*
2023-05-25T12:35:19Z
validation by library/open access desk
1
20.500.12860/41520
2023-04-30T04:07:33Z
*Selected version
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