Browsing by author "Dinh, Cong Que"
Now showing items 1-3 of 3
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Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023)