Browsing by author "Vandenberghe, Geert"
Now showing items 1-20 of 222
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
Bekaert, Joost; Hendrickx, Eric; Vandenberghe, Geert (2008) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
A 65-nm node SRAM solution using alt-PSM with ArF lithography
Driessen, Frank; Zawadzki, Mary T.; Krishnan, Prakash R.; Balasinski, Artur; Vandenberghe, Geert (2004-05) -
A methodology for double patterning compliant split and design
Wiaux, Vincent; Verhaegen, Staf; Iwamoto, Fumio; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008) -
A Novel Main Chain Scission Type Photoresists for EUV Lithography
Shirotori, A.; Hoshino, M.; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, H. (2020) -
A progress report on DSA of high-chi silicon containing block co-polymers
Willson, C. Grant; Janes, Dustin; Ito, Natsuko; Blachut, Gregory; Sirard, Stephen; Someya, Yasunobu; Doise, Jan; Mizuochi, Ryuta; Lane, Austin; Vandenberghe, Geert; Rincon Delgadillo, Paulina; Yang, XiaoMin; Ellison, Christopher (2018) -
Achievements and concerns of 193 nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Advanced lithography materials as key scaling enablers
Vandenberghe, Geert; De Simone, Danilo; Gronheid, Roel (2014) -
AIMS TM 45 inspection of CH treated with inverse lithography
Hendrickx, Eric; Birkner, Robert; Kempsell, Monica; Tritchkov, Alexander; Richter, Rigo; Vandenberghe, Geert; Scheruebl, Thomas (2008) -
AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
Hendrickx, Eric; Birkner, R.; Kempsell, Monica; Tritchkov, A.; Vandenberghe, Geert; Scheruebl, T. (2008) -
Alternative EUV mask technology for mask 3D effect compensation
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Knops, Roel; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2014) -
Alternative EUV mask technology to compensate for mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Verhaegen, Staf; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt (2002) -
Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
ArF immersion lithography for low k1 lines and contacts
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004-08) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001)