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AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
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AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
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Date
2008
Proceedings Paper
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17436.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hendrickx, Eric
;
Birkner, R.
;
Kempsell, Monica
;
Tritchkov, A.
;
Vandenberghe, Geert
;
Scheruebl, T.
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1890
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations
Metrics
Views
1890
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations