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Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
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Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
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Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhaegen, Staf
;
Vandenberghe, Geert
;
Jonckheere, Rik
;
Ronse, Kurt
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2028
since deposited on 2021-10-14
Acq. date: 2026-01-25
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Views
2028
since deposited on 2021-10-14
Acq. date: 2026-01-25
Citations