Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Publication:
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Copy permalink
Date
2002
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhaegen, Staf
;
Vandenberghe, Geert
;
Jonckheere, Rik
;
Ronse, Kurt
Journal
Abstract
Description
Metrics
Views
2026
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
2026
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-10
Citations