Publication:

Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process

Date

2002

Proceedings Paper

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Author(s)

Verhaegen, Staf

;

Vandenberghe, Geert

;

Jonckheere, Rik

;

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2029 since deposited on 2021-10-14

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Acq. date: 2026-02-27