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Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Publication:
Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process
Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhaegen, Staf
;
Vandenberghe, Geert
;
Jonckheere, Rik
;
Ronse, Kurt
Journal
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2025
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
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2025
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations