Alternative EUV mask technology to compensate for mask 3D effects

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Authors
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo
Conference
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Title
Alternative EUV mask technology to compensate for mask 3D effects
Publication type
Proceedings paper
Embargo date
9999-12-31
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