Publication:

Alternative EUV mask technology to compensate for mask 3D effects

Date

2015
Proceedings Paper
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dc.contributor.authorVan Look, Lieve
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorVan Oosten, Anton
dc.contributor.authorMiyazaki, Junji
dc.contributor.authorFliervoet, Timon
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorNeumann, Jens Timo
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-23T00:15:52Z
dc.date.available2021-10-23T00:15:52Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26086
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397267
dc.source.beginpage96580I
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.title

Alternative EUV mask technology to compensate for mask 3D effects

dc.typeProceedings paper
dspace.entity.typePublication
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