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Alternative EUV mask technology to compensate for mask 3D effects
Publication:
Alternative EUV mask technology to compensate for mask 3D effects
Date
2015
Proceedings Paper
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31967.pdf
1.41 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Look, Lieve
;
Philipsen, Vicky
;
Hendrickx, Eric
;
Vandenberghe, Geert
;
Davydova, Natalia
;
Wittebrood, Friso
;
De Kruif, Robert
;
Van Oosten, Anton
;
Miyazaki, Junji
;
Fliervoet, Timon
;
Van Schoot, Jan
;
Neumann, Jens Timo
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1886
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations
Metrics
Views
1886
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations