248 nm lithography for the 0.18 μm generation

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Authors
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper
Conference
Proceedings of the Microlithography Seminar INTERFACE'96
Title
248 nm lithography for the 0.18 μm generation
Publication type
Proceedings paper
Embargo date
9999-12-31
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