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248 nm lithography for the 0.18 μm generation
Publication:
248 nm lithography for the 0.18 μm generation
Date
1996
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandenberghe, Geert
;
Tzviatkov, Plamen
;
Yen, Anthony
;
Ronse, Kurt
;
Van den hove, Luc
;
Luehrmann, P.
;
Slonaker, S.
;
van Ingen Schenau, K.
;
Juffermans, Casper
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2
since deposited on 2021-09-29
Acq. date: 2025-10-23
Views
1988
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Downloads
2
since deposited on 2021-09-29
Acq. date: 2025-10-23
Views
1988
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations