Publication:

248 nm lithography for the 0.18 μm generation

Date

1996
Proceedings Paper
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cris.virtual.orcid0009-0001-2424-1322
cris.virtual.orcid0000-0003-0803-4267
cris.virtualsource.department2a632d3a-7e43-4516-89cb-000c9e57f5f9
cris.virtualsource.departmentb4f8c238-ae6a-4a36-b09f-6a93bec3afa5
cris.virtualsource.department987ea135-86ab-40b5-a86e-f94391ccf5fe
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dc.contributor.authorVandenberghe, Geert
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorYen, Anthony
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorLuehrmann, P.
dc.contributor.authorSlonaker, S.
dc.contributor.authorvan Ingen Schenau, K.
dc.contributor.authorJuffermans, Casper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T15:43:04Z
dc.date.available2021-09-29T15:43:04Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1601
dc.source.beginpage29
dc.source.conferenceProceedings of the Microlithography Seminar INTERFACE'96
dc.source.conferencedate27/10/1996
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage42
dc.title

248 nm lithography for the 0.18 μm generation

dc.typeProceedings paper
dspace.entity.typePublication
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