Browsing by author "Vandenberghe, Geert"
Now showing items 21-40 of 222
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ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography with combination of moderate OAI and attenuated PSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2001) -
Arf solutions for low-k1 back-end imaging
Wiaux, Vincent; Montgomery, Patrick; Vandenberghe, Geert; Monnoyer, Philippe; Ronse, Kurt; Conley,; Litt,; Lucas,; Finders, Jo; Socha,; Van Den Broeke, (2003) -
Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002) -
AttPSM CD control: mask bias and flare effects
Kim, Young-Chang; Vandenberghe, Geert; Ronse, Kurt (2002) -
Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes (1998) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Fenger, Germain; Burbine, Andrew; Torres, J. Andres; Ma, Yuansheng; Granik, Yuri; Krasnova, Polina; Vandenberghe, Geert; Gronheid, Roel; Bekaert, Joost (2014) -
CD control for 180-nm and 130-nm gate-level lithography
Kim, Kee - Ho; Ronse, Kurt; Goethals, Mieke; Vandenberghe, Geert; Van den hove, Luc (1996) -
CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Vandenberghe, Geert; Marschner, Thomas; Ronse, Kurt; Socha, R.; Dusa, M. (1999) -
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2002) -
Challenges and outlook of 193nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions
Bekaert, Joost; Van Look, Lieve; Vandenberghe, Geert; Van Adrichem, Paul; Maslow, Mark J.; Gemmink, Jan-Willem; Cao, Hua; Hunsche, Stefan; Neumann, Jens Timo; Wolf, Alexander (2011) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Characterization and optimization of positive tone DUV resists on TiN substrates
Zandbergen, Peter; Gehoel-van Ansem, W.; Vandenberghe, Geert; Van Driessche, Veerle; Vloeberghs, H. (1997) -
Characterizing and modeling electrical response to light for metal based EUV photoresists
Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016) -
Chromeless phase lithography for contact hole imaging
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004) -
Combined illumination sources for hyper-NA contact hole printing
Bekaert, Joost; Truffert, Vincent; Willems, Patrick; Van Look, Lieve; Op de Beeck, Maaike; Hendrickx, Eric; Vandenberghe, Geert (2007) -
Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
Bekaert, Joost; Van Look, Lieve; Truffert, Vincent; Lazzarino, Frederic; Vandenberghe, Geert; Reybrouck, Mario; Tarutani, Shinji (2010-12) -
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Montgomery, Patrick K.; Litt, Lloyd; Conley, Will; Lucas, Kevin; van Wingerden, Johannes; Vandenberghe, Geert; Wiaux, Vincent (2004)