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Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
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Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
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Date
2004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Montgomery, Patrick K.
;
Litt, Lloyd
;
Conley, Will
;
Lucas, Kevin
;
van Wingerden, Johannes
;
Vandenberghe, Geert
;
Wiaux, Vincent
Journal
Journal of Microlithography, Microfabrication and Microsystems
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1894
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Acq. date: 2025-12-10
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Metrics
Views
1894
since deposited on 2021-10-15
3
last month
2
last week
Acq. date: 2025-12-10
Citations