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Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
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Authors
Montgomery, Patrick K.
;
Litt, Lloyd
;
Conley, Will
;
Lucas, Kevin
;
van Wingerden, Johannes
;
Vandenberghe, Geert
;
Wiaux, Vincent
Issue
2
Journal
Journal of Microlithography, Microfabrication and Microsystems
Volume
3
Title
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Publication type
Journal article
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