Publication:
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Date
| dc.contributor.author | Montgomery, Patrick K. | |
| dc.contributor.author | Litt, Lloyd | |
| dc.contributor.author | Conley, Will | |
| dc.contributor.author | Lucas, Kevin | |
| dc.contributor.author | van Wingerden, Johannes | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.date.accessioned | 2021-10-15T14:58:44Z | |
| dc.date.available | 2021-10-15T14:58:44Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9322 | |
| dc.source.beginpage | 276 | |
| dc.source.endpage | 283 | |
| dc.source.issue | 2 | |
| dc.source.journal | Journal of Microlithography, Microfabrication and Microsystems | |
| dc.source.volume | 3 | |
| dc.title | Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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