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Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Publication:
Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Date
2004
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Montgomery, Patrick K.
;
Litt, Lloyd
;
Conley, Will
;
Lucas, Kevin
;
van Wingerden, Johannes
;
Vandenberghe, Geert
;
Wiaux, Vincent
Journal
Journal of Microlithography, Microfabrication and Microsystems
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1889
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1889
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations