CD control for 180-nm and 130-nm gate-level lithography

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Authors

Kim, Kee - Ho; Ronse, Kurt; Goethals, Mieke; Vandenberghe, Geert; Van den hove, Luc

Issue

Autumn

Journal

Microlithography World

Title

CD control for 180-nm and 130-nm gate-level lithography

Publication type

Journal article

Embargo date

9999-12-31

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