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CD control for 180-nm and 130-nm gate-level lithography
Publication:
CD control for 180-nm and 130-nm gate-level lithography
Date
1996
Journal article
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1268.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Kee - Ho
;
Ronse, Kurt
;
Goethals, Mieke
;
Vandenberghe, Geert
;
Van den hove, Luc
Journal
Microlithography World
Abstract
Description
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2021
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations
Metrics
Views
2021
since deposited on 2021-09-29
Acq. date: 2025-10-24
Citations