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AIMS TM 45 inspection of CH treated with inverse lithography
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AIMS TM 45 inspection of CH treated with inverse lithography
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Date
2008
Proceedings Paper
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16982.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hendrickx, Eric
;
Birkner, Robert
;
Kempsell, Monica
;
Tritchkov, Alexander
;
Richter, Rigo
;
Vandenberghe, Geert
;
Scheruebl, Thomas
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1929
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Acq. date: 2026-01-26
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Views
1929
since deposited on 2021-10-17
1
last month
Acq. date: 2026-01-26
Citations