Browsing by author "Kawakami, Shinichiro"
Now showing items 1-10 of 10
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Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV patterning improvement toward high-volume manufacturing
Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke (2015) -
EUV process establishment through litho and etch for N7 node
Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming (2016) -
Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke; Shimura, Satoru (2014) -
Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
Onitsuka, Tomoya; Kawakami, Shinichiro; Dauendorffer, Arnaud; Shimura, Satoru; Nafus, Kathleen; Feurprier, Yannick; Foubert, Philippe; De Simone, Danilo (2021) -
Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe (2019) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Enomoto, Masashi; Nafus, Kathleen; Demand, Marc; Foubert, Philippe (2017)