Authors

Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe

Conference

Extreme Ultraviolet (EUV) Lithography X

Title

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Publication type

Proceedings paper