Publication:

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Date

2019
Proceedings Paper
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dc.contributor.authorKamei, Yuya
dc.contributor.authorSano, Yohei
dc.contributor.authorYamauchi, Takashi
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorTadokoro, Masahide
dc.contributor.authorEnomoto, Masashi
dc.contributor.authorMuramatsu, Makoto
dc.contributor.authorNafus, Kathleen
dc.contributor.authorSonoda, Akihiro
dc.contributor.authorDemand, Marc
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorFoubert, Philippe
dc.date.accessioned2021-10-27T11:05:45Z
dc.date.available2021-10-27T11:05:45Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33244
dc.identifier.urlhttps://doi.org/10.1117/12.2514930
dc.source.beginpage109571P
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.title

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

dc.typeProceedings paper
dspace.entity.typePublication
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