Authors

Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Enomoto, Masashi; Nafus, Kathleen; Demand, Marc; Foubert, Philippe

Conference

Extreme Ultraviolet (EUV) Lithography VIII

Title

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Publication type

Proceedings paper

Embargo date

9999-12-31