Publication:

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Date

2017
Proceedings Paper
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dc.contributor.authorKamei, Yuya
dc.contributor.authorShiozawa, Takahiro
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorShite, Hideo
dc.contributor.authorIchinomiya, Hiroshi
dc.contributor.authorEnomoto, Masashi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorDemand, Marc
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorFoubert, Philippe
dc.date.accessioned2021-10-24T06:35:56Z
dc.date.available2021-10-24T06:35:56Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28635
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2615277
dc.source.beginpage1014326
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

dc.typeProceedings paper
dspace.entity.typePublication
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