Browsing by author "De Simone, Danilo"
Now showing items 1-20 of 115
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
A Novel Main Chain Scission Type Photoresists for EUV Lithography
Shirotori, A.; Hoshino, M.; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, H. (2020) -
Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, Roberto; Chen, Steven; De Simone, Danilo; Suh, Hyo Seon (2022) -
Advanced lithography materials as key scaling enablers
Vandenberghe, Geert; De Simone, Danilo; Gronheid, Roel (2014) -
Alternative EUV materials. Status at imec
De Simone, Danilo (2015) -
Alternative patterning mechanisms for Extreme Ultraviolet Lithography
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2018) -
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
Van Dongen, Kaat; Nye, Rachel; Clerix, Jan-Willem; Sixt, Claudia; De Simone, Danilo; Delabie, Annelies (2023) -
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Characterizing and modeling electrical response to light for metal based EUV photoresists
Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016) -
Characterizing variation in EUV contact hole lithography
Mack, Chris; Lorusso, Gian; De Simone, Danilo; Severi, Joren (2020) -
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Severi, Joren; Lorusso, Gian F.; De Simone, Danilo; Moussa, Alain; Saib, Mohamed; Duflou, Rutger; De Gendt, Stefan (2022) -
Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
De Simone, Danilo; Lyons, Adam; Rio, David; Lee, Sook; Delorme, Maxence; Fumar-Pici, Anita; Kocsis, Michael; De Schepper, Peter; Greer, Michael; Wallow, THomas; Stowers, Jason K; Gillijns, Werner; Bekaert, Joost (2017) -
Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
Nye, Rachel; Van Dongen, Kaat; Oka, Hironori; De Simone, Danilo; Parsons, Gregory N. N.; Delabie, Annelies (2022) -
Defectivity study on dry development rinse process (DDRP)
Stokes, Harold; De Simone, Danilo; Thouroude, Yan; D'Urzo, Lucia; Sayan, Safak; Foubert, Philippe (2015) -
Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
De Simone, Danilo; Mao, Ming; Kocsis, Michael; De Schepper, Peter; Lazzarino, Frederic; Vandenberghe, Geert; Yamashita, Fumiko; Stowers, Jason; Meyers, Steven; Grenville, Andrew; Luong, Vinh; Parnell, Doni; Clark, Benjamin L. (2016) -
Development of main chain scission type photoresists for EUV lithography
Shirotori, Akihide; Vesters, Yannick; Hoshino, Manabu; Rathore, Ashish; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, Hirokazu (2019) -
Development on main chain scission resists for high-NA EUV lithography
Shirotori, Akihide; Hoshino, Manabu; Fujimura, Makoto; Yeh, Sin Fu; Suh, Hyo Seon; De Simone, Danilo; Vandenberghe, Geert; Sanuki, Hideaki (2023) -
Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography
Severi, Joren; De Simone, Danilo; De Gendt, Stefan (2020) -
Difference in EUV photoresist design towards reduction of LWR and LCDU
Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert (2017)