Difference in EUV photoresist design towards reduction of LWR and LCDU

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Authors
Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert
DOI
10.1117/12.2257899
Conference
Advances in Patterning Materials and Processes XXXIV
Title
Difference in EUV photoresist design towards reduction of LWR and LCDU
Publication type
Proceedings paper
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