Publication:

Difference in EUV photoresist design towards reduction of LWR and LCDU

Date

2017

Proceedings Paper

https://doi.org/10.1117/12.2257899

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Author(s)

;

De Simone, Danilo

;

Vandenberghe, Geert

Metrics

1951 since deposited on 2021-10-24

Acq. date: 2025-12-16