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Difference in EUV photoresist design towards reduction of LWR and LCDU
Publication:
Difference in EUV photoresist design towards reduction of LWR and LCDU
Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2257899
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jiang, Jing
;
De Simone, Danilo
;
Vandenberghe, Geert
Journal
Abstract
Description
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1950
since deposited on 2021-10-24
Acq. date: 2025-10-26
Citations
Metrics
Views
1950
since deposited on 2021-10-24
Acq. date: 2025-10-26
Citations