Publication:

Difference in EUV photoresist design towards reduction of LWR and LCDU

Date

2017

Proceedings Paper

https://doi.org/10.1117/12.2257899

Simple item page Full metadata Statistics

Author(s)

;

De Simone, Danilo

;

Vandenberghe, Geert

Statistics

1953 since deposited on 2021-10-24

2last month

1last week

Acq. date: 2026-03-17