Browsing by author "De Simone, Danilo"
Now showing items 21-40 of 114
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Dissolution rate monitor tool to measure EUV photoresist dissolution
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2017) -
Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Sayan, Safak; Tao, Zheng; Chan, BT; De Simone, Danilo; Kuwahara, Yuhei; Nafus, Kathleen; Leeson, Michael J.; Gstrein, Florian; Singh, Arjun; Vandenberghe, Geert (2015) -
Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Lorusso, Gian; De Simone, Danilo; De Silva, Anuja; Haider, Ali; Verveniotis, Elisseos; Moussa, Alain; De Gendt, Stefan (2023) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Rathore, Ashish; Cipriani, Maicol; Huang, Ching-Chung; Amiaud, Lionel; Dablemont, Celine; Lafosse, Anne; Ingolfsson, Oddur; De Simone, Danilo; De Gendt, Stefan (2021) -
Enabling CD SEM metrology for 5nm technology node and beyond
Lorusso, Gian; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnemont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru (2017) -
Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition
Nye, Rachel; Van Dongen, Kaat; De Simone, Danilo; OKa, Hironori; Parsons, Gregory N.; Delabie, Annelies (2023) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
EUV contact holes and pillars pattering
Park, Sarohan; De Simone, Danilo; Tao, Zheng; Vandenberghe, Geert; Hyun, Yoonsuk; Kim, Seo-Min; Lim, Chang-Moon (2015) -
EUV extendibility via dry development rinse process
Sayan, Safak; Tao, Zheng; De Simone, Danilo; Vandenberghe, Geert (2016) -
EUV lithographic process enablement with novel litho track hardware
Santos, Andreia; Kosma, Vasiliki; Vandereyken, Jelle; Marhfour, H.; Tanaka, Y.; Harumoto, M.; Asai, M.; Stokes, H.; Suh, Hyo Seon; Foubert, Philippe; De Simone, Danilo (2021) -
EUV lithography and the materials that propel it forward
Gallagher, Emily; Hendrickx, Eric; Kim, Ryan Ryoung han; Leray, Philippe; Philipsen, Vicky; Pollentier, Ivan; Rincon Delgadillo, Paulina; Ronse, Kurt; Timmermans, Marina; De Simone, Danilo (2020) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV photoresist patterning characterization for imec N7/N5 technology
De Simone, Danilo; Rutigliani, Vito; Lorusso, Gian; De Bisschop, Peter; Vesters, Yannick; Blanco, Victor; Vandenberghe, Geert (2018) -
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert (2021) -
EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
De Simone, Danilo; Sanapala, Ravikumar; Andrrew, Cross; Preil, Moshe; Qian, Jin; Sumar, Shishir; Anantha, Vidyasagar; Sah, Kaushik; Eitapence, Scott; Van Den Heuvel, Dieter; Foubert, Philippe (2017) -
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Fallica, Roberto; Nannarone, Stefano; Mahne, Nicola; Malvezzi, Andrea Marco; Berti, Andrea; De Simone, Danilo (2021)