Browsing by author "De Simone, Danilo"
Now showing items 41-60 of 114
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Experimental validation of stochastic modeling for negative-tone develop EUV resist
Kamohara, Itaru; Gao, Weimin; Klostermann, Ulrich; Schmöller, Thomas; Demmerle, Wolfgang; Lucas, Kevin; De Simone, Danilo; Hendrickx, Eric; Vandenberghe, Geert (2015) -
Exploring the readiness of EUV photo materials for patterning
De Simone, Danilo; Vesters, Yannick; Shehzad, Atif; Vandenberghe, Geert; Foubert, Philippe; Beral, Christophe; Van Den Heuvel, Dieter; Mao, Ming; Lazzarino, Frederic (2017) -
Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser
Zidan, Mohamed; Dey, Bappaditya; De Simone, Danilo; Severi, Joren; Charley, Anne-Laure; Halder, Sandip; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2022) -
Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Rathore, Ashish; Pollentier, Ivan; Cipriani, Maicol; Singh, Harpreet; De Simone, Danilo; Ingolfsson, Oddur; De Gendt, Stefan (2021) -
Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
Rathore, Ashish; Pollentier, Ivan; Kumar, Sunkuru S.; De Simone, Danilo; De Gendt, Stefan (2021) -
Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
Fallica, Roberto; Huang, Weizhong; Suh, Hyo Seon; De Simone, Danilo; Guerrero, Douglas J.; Kato, Kodai (2023) -
High NA EUV: a challenge for metrology, an opportunity for atomic force microscopy
Moussa, Alain; Severi, Simone; Lorusso, Gian; De Simone, Danilo; Charley, Anne-Laure (2021) -
High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
Sayan, Safak; Vanelderen, Pieter; Hetel, Iulian; Chan, BT; Raghavan, Praveen; Blanco, Victor; Foubert, Philippe; D'Urzo, Lucia; De Simone, Danilo; Vandenberghe, Geert (2017) -
Impact of acid statistics on EUV local critical dimension uniformity
Jiang, Jing; De Simone, Danilo; Yildirim, Oktay; Meeuwissen, Marieke; Hoefnagels, Rik; Rispens, Gijs; Derks, Paul; Custers, Rolf (2017) -
Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Vanelderen, Pieter; Blanco, Victor; Mao, Ming; Tomczak, Yoann; De Roest, David; Kissoon, Nicola; Rincon Delgadillo, Paulina; Rispens, Gijsbert; Schiffelers, Guido; Pathak, Abhinav; Lazzarino, Frederic; De Simone, Danilo; De Poortere, Etienne; Mc Manus, Moyra; Piumi, Daniele; Hendrickx, Eric; Vandenberghe, Geert (2019) -
Improved resolution with main chain scission resists for EUV lithography
Shirotori, Akihide; Hoshino, Manabu; Rathore, Ashish; Fu, Yeh Sin; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, Hirokazu (2022) -
Improvements in the measurement of local critical dimension uniformity for holes and pillars
Mack, Chris A.; Delvaux, Christie; De Simone, Danilo; Lorusso, Gian (2023) -
Improving polymethacrylate EUV resists with TiO2 area-selective deposition
Nye, Rachel; Van Dongen, Kaat; Oka, Hironori; Furutani, Hajime; Parsons, Gregory; De Simone, Danilo; Delabie, Annelies (2022) -
Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning
Hasan, Mahmudul; Beral, Christophe; Lorusso, Gian; De Simone, Danilo; Moussa, Alain; Van den Heuvel, Dieter; Charley, Anne-Laure; Leray, Philippe (2022) -
Inluence of post exposure bake time on EUV photoresist RLS trade-off
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2017) -
Integrated fab process for metal oxide EUV photoresist
Grenville, Andrew; Anderson, Jeremy T.; Clark, Benjamin L.; De Schepper, Peter; Edson, Joseph; Greer, Michael; Kai, Jiang; Kocsis, Michael; Meyers, Stephen T.; Stowers, Jason K.; Telecky, Alan J.; De Simone, Danilo; Vandenberghe, Geert (2015) -
LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement
Pak, Murat; Crotti, Davide; Yasin, Farrukh; Ercken, Monique; Halder, Sandip; De Simone, Danilo; Vanelderen, Pieter; Souriau, Laurent; Hody, Hubert; Kar, Gouri Sankar (2019) -
LENS - Lithography enhancement towards nano scale
Cantu, Pietro; Baldi, Livio; De Simone, Danilo; Piacentini, Paolo; Fliervoet, Timon; Alberga, Gerold; Le Gratiet, Bertrand; Gaugiran, Stephanie; Wong, Patrick; Miyashita, Hiroyuki; Atzei, Luisa Rita; Buch, Xavier; Verkleiji, Dick; Toublan, Olivier; Perez Murano, Francesc; Mecerreyes, David (2010) -
Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Dorney, Kevin; Castellanos, Sonia; Witting Larsen, Esben; Holzmeier, Fabian; Singh, Dhirendra Pratap; Vandenbroeck, Nadia; De Simone, Danilo; De Schepper, Peter; Vaglio Pret, Alessandro; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Nuytten, Thomas; van der Heide, Paul; Petersen, John (2021) -
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022)