Publication:

Integrated fab process for metal oxide EUV photoresist

Date

2015

Proceedings Paper

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Files

33316.pdf 3.09 MB

Author(s)

Grenville, Andrew

;

Anderson, Jeremy T.

;

Clark, Benjamin L.

;

De Schepper, Peter

;

;

;

;

Kocsis, Michael

;

Meyers, Stephen T.

;

Stowers, Jason K.

;

Telecky, Alan J.

;

De Simone, Danilo

;

Vandenberghe, Geert

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