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Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
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Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
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Date
2021
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dorney, Kevin
;
Castellanos, Sonia
;
Witting Larsen, Esben
;
Holzmeier, Fabian
;
Singh, Dhirendra Pratap
;
Vandenbroeck, Nadia
;
De Simone, Danilo
;
De Schepper, Peter
;
Vaglio Pret, Alessandro
;
Bargsten, Clayton
;
Cousin, Seth
;
Raymondson, Daisy
;
Rinard, Eric
;
Ward, Rod
;
Kapteyn, Henry
;
Nuytten, Thomas
;
van der Heide, Paul
;
Petersen, John
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2263
since deposited on 2021-10-31
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Acq. date: 2026-01-10
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Views
2263
since deposited on 2021-10-31
2
last month
Acq. date: 2026-01-10
Citations