Impact of acid statistics on EUV local critical dimension uniformity

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Authors
Jiang, Jing; De Simone, Danilo; Yildirim, Oktay; Meeuwissen, Marieke; Hoefnagels, Rik; Rispens, Gijs; Derks, Paul; Custers, Rolf
DOI
10.1117/12.2257903
Conference
Extreme Ultraviolet (EUV) Lithography
Title
Impact of acid statistics on EUV local critical dimension uniformity
Publication type
Proceedings paper
Embargo date
9999-12-31
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