Exploring the readiness of EUV photo materials for patterning

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Authors
De Simone, Danilo; Vesters, Yannick; Shehzad, Atif; Vandenberghe, Geert; Foubert, Philippe; Beral, Christophe; Van Den Heuvel, Dieter; Mao, Ming; Lazzarino, Frederic
DOI
10.1117/12.2258220
Conference
Extreme Ultraviolet (EUV) Lithography VIII
Title
Exploring the readiness of EUV photo materials for patterning
Publication type
Proceedings paper
Embargo date
9999-12-31
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