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Exploring the readiness of EUV photo materials for patterning
Publication:
Exploring the readiness of EUV photo materials for patterning
Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2258220
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36976.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Vesters, Yannick
;
Shehzad, Atif
;
Vandenberghe, Geert
;
Foubert, Philippe
;
Beral, Christophe
;
Van Den Heuvel, Dieter
;
Mao, Ming
;
Lazzarino, Frederic
Journal
Abstract
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1987
since deposited on 2021-10-24
417
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Acq. date: 2025-10-25
Citations
Metrics
Views
1987
since deposited on 2021-10-24
417
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations