Publication:

Exploring the readiness of EUV photo materials for patterning

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2258220
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVesters, Yannick
dc.contributor.authorShehzad, Atif
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFoubert, Philippe
dc.contributor.authorBeral, Christophe
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorMao, Ming
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2021-10-24T03:56:55Z
dc.date.available2021-10-24T03:56:55Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.doi10.1117/12.2258220
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28161
dc.source.beginpage101430R
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Exploring the readiness of EUV photo materials for patterning

dc.typeProceedings paper
dspace.entity.typePublication
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