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E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
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Authors
Zidan, Mohamed
;
Lorusso, Gian
;
De Simone, Danilo
;
De Silva, Anuja
;
Haider, Ali
;
Verveniotis, Elisseos
;
Moussa, Alain
;
De Gendt, Stefan
DOI
10.1117/1.JMM.22.4.044001
ISSN
1932-5150
Issue
4
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
22
Title
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Publication type
Journal article
Embargo date
2023-11-30
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