Publication:

E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

Date

2023
Journal article
https://doi.org/10.1117/1.jmm.22.4.044001
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Published version 2.76 MB

Author(s)

Zidan, Mohamed  
;
Lorusso, Gian  
;
De Simone, Danilo  
;
De Silva, Anuja
;
Haider, Ali
;
Verveniotis, Elisseos
;
Moussa, Alain  
;
De Gendt, Stefan  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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898 since deposited on 2024-04-18
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