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E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

 
dc.contributor.authorZidan, Mohamed
dc.contributor.authorLorusso, Gian
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Silva, Anuja
dc.contributor.authorHaider, Ali
dc.contributor.authorVerveniotis, Elisseos
dc.contributor.authorMoussa, Alain
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.date.accessioned2024-04-18T14:15:57Z
dc.date.available2024-04-18T14:15:57Z
dc.date.embargo2023-11-30
dc.date.issued2023
dc.description.wosFundingTextPart of this manuscript has been previously published in the SPIE Conference Proceedings: Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249612 (27 April 2023) 10.1117/12.2658280.13 We would like to acknowledge Joern-Holger Franke from imec for the fruitful discussion and calculating the NILS values.
dc.identifier.doi10.1117/1.JMM.22.4.044001
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43851
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 044001
dc.source.endpageN/A
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages11
dc.source.volume22
dc.title

E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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