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Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Publication:
Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Date
2015
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sayan, Safak
;
Tao, Zheng
;
Chan, BT
;
De Simone, Danilo
;
Kuwahara, Yuhei
;
Nafus, Kathleen
;
Leeson, Michael J.
;
Gstrein, Florian
;
Singh, Arjun
;
Vandenberghe, Geert
Journal
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2026
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations
Metrics
Views
2026
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations