Authors

De Simone, Danilo; Sanapala, Ravikumar; Andrrew, Cross; Preil, Moshe; Qian, Jin; Sumar, Shishir; Anantha, Vidyasagar; Sah, Kaushik; Eitapence, Scott; Van Den Heuvel, Dieter; Foubert, Philippe

DOI

10.1117/12.2281632

Conference

Photomask Technology

Title

EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems

Publication type

Proceedings paper

Embargo date

9999-12-31