Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
Publication:
EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2281632
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
37784.pdf
545.71 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Sanapala, Ravikumar
;
Andrrew, Cross
;
Preil, Moshe
;
Qian, Jin
;
Sumar, Shishir
;
Anantha, Vidyasagar
;
Sah, Kaushik
;
Eitapence, Scott
;
Van Den Heuvel, Dieter
;
Foubert, Philippe
Journal
Abstract
Description
Metrics
Views
1991
since deposited on 2021-10-24
Acq. date: 2025-10-26
Citations
Metrics
Views
1991
since deposited on 2021-10-24
Acq. date: 2025-10-26
Citations