Publication:

EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2281632
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSanapala, Ravikumar
dc.contributor.authorAndrrew, Cross
dc.contributor.authorPreil, Moshe
dc.contributor.authorQian, Jin
dc.contributor.authorSumar, Shishir
dc.contributor.authorAnantha, Vidyasagar
dc.contributor.authorSah, Kaushik
dc.contributor.authorEitapence, Scott
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSah, Kaushik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-24T03:56:12Z
dc.date.available2021-10-24T03:56:12Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.doi10.1117/12.2281632
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28158
dc.source.beginpage104510L
dc.source.conferencePhotomask Technology
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems

dc.typeProceedings paper
dspace.entity.typePublication
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